The board
Micron- Hours
- Full time
- Where
- Boise, ID - Main Site
- Posted
- Sep 1
Our vision is to transform how the world uses information to enrich life for all.
Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.
Welcome to Micron’s Advanced Mask Development Group! We are a group of engineers who provide advanced technology solution of Optical Proximity Correction (OPC) and Resolution Enhancement Techniques (RET) to support wafer process development. Through the rigorous simulation and data analysis, we develop the optimization strategy and methodology in reticle design to support all Micron products, using various tools, scripts and programming to improve process window of semiconductor process on wafers.
What you'd do
- Study and comprehend photolithography modeling theory and simulation methodology.
- Build AI work flow and programs for RET/OPC tasks.
- Improve beyond the existing metrics achieved by the Process-Of-Record.
- Build a document of Best Known Method based from your learning, and to detail the thought process and the supporting data.
- Work on a hands-on and collaborative project with the Photolithography group in Technology Development.
- Build automated scripts and/or program to improve the efficiency of the current methodology.
- Identify potential opportunities of improvement, including areas which can be challenging to achieve during the internship period.
- Pursuing a BS, MS, or PhD in Engineering or Science. Graduation date should not be prior to September 1, 2027
- Validated analytical skills
- Experience in multi-tasking and driving complex projects
- Starts
- 2026-08-31